Nano-Vault Architecture Dissipating Stress in Si films for Li-Ion Batteries
Other inventors:
Haro, Marta
Grammatikopoulos, Panagiotis
Zhao, Junlei
Active patent:
Sí
Priority countries:
Japón
Priority start date:
09/2020
Entities holding the patent:
OIST
Application number:
63/075,455
Countries that the patent is extended through:
USA
Exploitation date:
2020